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Technology Information:

Field Guide to Optical Lithography (SPIE Vol. FG06)

Description

The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.

Contents

- Symbol Glossary
- The Lithgraphy Process
- Image Formation
- Imaging into a Photoresist
- Photoresist Chemistry
- Lithography Control and Optimization
- Equation Summary
- Glossary
- Index

Reviews

Rating: 5 / 5
Date: 2008-09-01
Summary: "Outstanding introduction to litho"

For those of us who use and design chips (but don't always know a lot about making them), Chris Mack's little book on lithography functions both as a great introduction and as a pocket book to carry to conferences and visits to chip "fabs" (factories). It's well written, requires a minimum of domain knowledge, and (almost most important), the small size/format is great for literally carrying everywhere in your back pocket. (Contrast that with most books on litho which are tomes of several hundred pages.) Chris Mack is the original author of Prolith (a lithography simulator), now maintained and marketed by KLA-Tencor. Note that SPIE members (the professional organization for those interested in lithography) can obtain this SPIE book directly for a few dollars less.